High Performing Instruments for High Performance Materials

High performance polymers—like Polyimides (PI), Polyether ether ketones (PEEK), fluoropolymers (PTFE), and their composites—are essential in lightweight, high temperature, and chemical resistant applications, but they also come with challenging questions that need to be answered.

• What’s the ash or filler content?
• Can we identify unknown contaminants or breakdown products?

LECO’s organic and thermal analysis instruments quantify nitrogen, moisture, ash, carbon black, and additives.  Our GC-MS instruments can be used to accurately separate and detect trace contaminants or quantitate regulated substances in a variety of sample materials.

In the semiconductor industry, even the slightest impurity or structural flaw can undermine device reliability. From ultra-pure silicon wafers to advanced ceramics like silicon carbide, manufacturers face critical questions.

• Is the Oxygen content in Silicon Wafers below critical limits to prevent performance degradation?
• Are dopant and thin-film layer compositions uniform and within spec throughout their depth?
• Can we detect trace contaminants (O, N, H, C, S) before they cause device failures?
• How can we differentiate and measure residual free Carbon vs. bound (carbide) Carbon in Silicon Carbide?
• Are the microstructures of wafers and electronic components free of defects after processing?

LECO provides solutions for Oxygen/Nitrogen/Hydrogen analysis, Carbon/Sulfur determination, quantitative depth profiling, and metallographic evaluation, ensuring your semiconductor materials meet the strictest purity and performance standards.